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Pattern Transfer: Self-Assembled Monolayers as Ultrathin Resists
Pattern Transfer: Self-Assembled Monolayers as Ultrathin Resists
Publication information:
Y. Xia, X-M. Zhao, and G. M. Whitesides. 1996. “Pattern Transfer: Self-Assembled Monolayers As Ultrathin Resists”. Microelec. Eng., 32, Pp. 255-68
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