Demonstration of a Nanolithographic System Using a Self-Assembled Monolayer Resist for Neutral Atomic Cesium
Publication information:
K. K. Berggren, R. Youkin, E. Cheung, M. G. Prentiss, A. J. Black, G. M. Whitesides, D. C. Ralph, C. T. Black, and M. Tinkham. 1997. “Demonstration of a Nanolithographic System Using a Self-Assembled Monolayer Resist for Neutral Atomic Cesium”. Advanced Materials, 9, Pp. 52-55
Notes
538