Using an Elastomeric Phase Mask for sub-100 nm Photolithography in the Optical Near Field
Publication information:
J. A. Rogers, K. E. Paul, R. J. Jackman, and G. M. Whitesides. 1997. “Using an Elastomeric Phase Mask for Sub-100 Nm Photolithography in the Optical Near Field”. Applied Physics Letters, 70, Pp. 2658-60
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