Maskless Lithography: Embossed Photoresist as its Own Optical Element
Publication information:
K. E. Paul, T. L. Breen, J. Aizenberg, and G. M. Whitesides. 1998. “Maskless Lithography: Embossed Photoresist As Its Own Optical Element”. Applied Physics Letters, 73, Pp. 2893-95
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