Imaging profiles of light intensity in the near field: applications to phase-shift photolithography
Publication information:
J. Aizenberg, J. A. Rogers, K. E. Paul, and G. M. Whitesides. 1998. “Imaging Profiles of Light Intensity in the Near Field: Applications to Phase-Shift Photolithography”. Applied Optics, 37, Pp. 2145-52
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