Generating ~90 nanometer features using near-field contact-mode photolithography with an elastomeric phase mask
Publication information:
J. A. Rogers, K. E. Paul, R. J. Jackman, and G. M. Whitesides. 1998. “Generating ~90 Nanometer Features Using Near-Field Contact-Mode Photolithography With an Elastomeric Phase Mask”. J. Vac. Sci. Technol. B, 16, Pp. 59-68
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